The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 04, 1989

Filed:

Apr. 26, 1988
Applicant:
Inventors:

Jiann Liu, Irving, TX (US);

Cecil J Davis, Greenville, TX (US);

Lee M Loewenstein, Plano, TX (US);

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
B44C / ; B05D / ; C23F / ; C03C / ;
U.S. Cl.
CPC ...
156345 ; 156643 ;
Abstract

A processing apparatus and method for providing a process module with a low pressure, low energy ion implanter and a remote microwave plasma generator and a source of thermal energy, which is adapted to receive wafers for processing in a low pressure carrier.


Find Patent Forward Citations

Liu, Jiann. (1989). Processing apparatus (U.S. Patent No. 4818326). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4818326

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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