The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 28, 1989
Filed:
Dec. 23, 1985
Masatoshi Nakayama, Tokyo, JP;
Haruyuki Morita, Tokyo, JP;
Yuichi Kubota, Tokyo, JP;
Keiko Tsuchiya, Tokyo, JP;
TDK Corporation, Tokyo, JP;
Abstract
In a magnetic recording medium comprising a base film and a magnetic layer formed on the base film, the base film has been plasma treated in an atmosphere consisting essentially of an inorganic gas containing N, H, and optionally O at frequencies in the range of 10 to 200 kHz. A perpendicular magnetizable metal thin film layer can be deposited on the plasma-treated surface of a resin substrate having a heat distortion temperature of at least 150.degree. C. without disturbance on the crystal structure of the layer.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile