The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 21, 1989
Filed:
Apr. 15, 1988
Applicant:
Inventor:
Sun Lu, San Jose, CA (US);
Assignee:
The Mead Corporation, Dayton, OH (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01D / ;
U.S. Cl.
CPC ...
346160 ; 346157 ;
Abstract
A method and apparatus for creating a photomask corresponding to an image utilizes a planar disc having at least a portion of its surface formed from a photosensitive material. The disc is mounted for rotation. A laser beam source is supported at a spaced relationship with respect to the disc. One or more laser beams from the source are focused onto the disc. The laser source is moved radially with respect to the disc, whereby the laser beams scan the surface of the disc. The beams are modulated in accordance with information corresponding to the image to cause the image to be written onto the photosensitive material on the rotating disc by the laser beam.