The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 21, 1989

Filed:

Mar. 17, 1987
Applicant:
Inventors:

Peter Van Der Meulen, Eindhoven, NL;

Gerrit H Van Yperen, Eindhoven, NL;

Assignee:

U.S. Philips Corporation, New York, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01R / ;
U.S. Cl.
CPC ...
324309 ; 324307 ;
Abstract

The known magnetic resonance imaging method of determining the r.f. power or pulse angle of an r.f. electromagnetic 90.degree.-pulse or 180.degree.-pulse has the drawback that the measurement inaccuracy is often high, that the experimentation time is comparatively long and that its use is limited to r.f. electromagnetic 90.degree.-pulses or 180.degree.-pulses only. In order to mitigate these drawbacks, it is proposed to determine the pulse angle of an r.f. electromagnetic pulse having a pulse angle .alpha. from two out of five echo resonance signals, including one stimulated echo resonance signal, generated by means of three r.f. electromagnetic .alpha..degree.-pulses, .alpha. having an arbitrary value (calibration phase), after which any .beta. can be adjusted by adaptation of the applied r.f. power.


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