The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 14, 1989

Filed:

Nov. 24, 1987
Applicant:
Inventors:

Mitsuyasu Honda, Hiroshima, JP;

Touru Seto, Hiroshima, JP;

Shigeaki Mitsuoka, Hiroshima, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01J / ; B01J / ; B01J / ; B01D / ;
U.S. Cl.
CPC ...
502 34 ; 422178 ; 4232155 ; 423239 ; 502 20 ;
Abstract

In a reaction device in which catalyst layers having vertical passages for a waste gas are arranged, gas rectifying plates are disposed at regular intervals above the catalyst layers and these rectifying plates are each supported by a shaft at the upper portion thereof, moving the lower end portions of the adjacent rectifying plates into contact with each other so as to maintain a V-shape region for a predetermined period of time. Collecting dust in the waste gas in the V-shape region formed by the rectifying plates and then dropping the dust downwardly onto the catalyst layers intermittently, and thereby cleaning the surfaces of the catalyst layers.


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