The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 14, 1989
Filed:
Mar. 27, 1987
R Kenneth Marcus, Charlottesville, VA (US);
W W Harrison, Charlottesville, VA (US);
The University of Virginia Alumni Patents Foundation, Charlottesville, VA (US);
Abstract
Sample material is sputtered from an orifice in a disc mounted in a hollow cathode. A plasma plume is ejected from the orifice and the material sputtered from the smaple is transported directly into the base of the plasma plume. Collisions with particles in the plasma plume excite the sputtered material. Light emission and absorption from the plume are measured and ions in the plume are measured. A chamber surrounding the plasma plume is maintained at about 1 torr. About 15 cc's per minute of argon are supplied to the hollow cathode at 2 torr. The power supply supplies about 200 volts at about 0.10 amps. Low energy argon ions strick the disc at the end of the cathode tube and sputter atoms off the aperture. Atoms collide with particles in the plasma causing excitation, photon emission and ionization of atoms which are measured by optical and mass spectrometers.