The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 14, 1989
Filed:
Mar. 25, 1988
Abstract
A thin film deposition apparatus includes an ionizing means for ionizing part of clusters from a vapor generating source by the cluster ion beam method. The ionizing means has an ionizing filament for emitting thermoelectrons to ionize the clusters, an electron extracting electrode for accelerating the thermoelectrons toward the clusters, and an electron controlling electrode disposed on the side of the electron extracting electrode for controlling the presence of the thermoelectrons at the center of the ionizing section. The thermoelectrons are substantially eliminated in the vicinity of the center of the ionizing portion due to the provision of the thermoelectron extracting electrode, thereby substantially eliminating the cluster ions generated in the vicinity of the center of the ionizing portion and reducing the quantity of clusters that concentrate on the center of a substrate. This makes the ion distribution on the substrate uniform so as to enable formation of a thin film which is uniform in terms of film thickness and film quality.