The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 07, 1989

Filed:

Feb. 08, 1988
Applicant:
Inventors:

Oded Kafri, Beersheva, IL;

Ilana Glatt, Beersheva, IL;

Assignee:

Rotlex Optics Ltd., Beer Sheva, IL;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01N / ;
U.S. Cl.
CPC ...
250571 ; 250572 ;
Abstract

A method and apparatus for moire ray deflection mapping for determining properties of an object in which a point source of light producing a diverging beam of direct light is passed through a first optical system including the object to be examined, which system retraces the light in the form of a converging beam of reflected light from the examined object back towards the point source. The converging beam of reflected light is intercepted before reaching the point source and is passed through a second optical system which collimates the beam of reflected light. The collimated beam is then directed through first and second gratings at a preselected angular orientation with respect to each other to produce moire fringe patterns providing an indication of the properties of the examined object. An important advantage in the above novel method is that the same setup can be used for measurements of both phase objects and specular surfaces.


Find Patent Forward Citations

Loading…