The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 07, 1989

Filed:

Oct. 14, 1986
Applicant:
Inventors:

Koh Kamada, Odawara, JP;

Hiroshi Hashimoto, Odawara, JP;

Tsutomu Okita, Odawara, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B29C / ;
U.S. Cl.
CPC ...
264 22 ; 264-14 ; 264 24 ; 264106 ; 427 44 ;
Abstract

A method of making a substrate for a magnetic recording medium comprises the steps of applying a radiation-polymerizable compound at least to one surface of a base sheet, closely contacting a surface of a transfer member with a surface of a coating layer thus formed of the radiation-polymerizable compound, exposing the coating layer to a radiation from the side of the base sheet or the transfer member, whichever is permeable to the radiation, and separating the transfer member form the surface of the coating layer. The surface of the transfer member is adjusted so that the arithmetical mean deviation at a cut-off value of 0.25 mm and at a measuring length of 80 mm is within the range of 0.001 .mu.m to 0.050 .mu.m, and the ratio of the maximum height at a cut-off value of 0.25 mm and at a measuring length of 20 mm to the arithmetical mean deviation is within the range of 5:1 to 20:1.


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