The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 07, 1989
Filed:
Oct. 21, 1987
Bernd Wolf, Hanau, DE;
Peter Wirz, Waldernbach, DE;
Leybold Aktiengesellschaft, Hanau I, DE;
Abstract
Sputtering cathode (1) according to the magnetron principle, having a target (11) of the material to be sputtered, which consists of at least one piece. Behind the target (11) there is a magnet system with a plurality of endless magnet units (14, 15, 16) of alternately different polarity, one inside the other. An endless magnetic tunnel (20) of arcuately curved lines of force is thereby formed. Those poles of the magnet units (14, 15, 16) which are turned away from the target (11) are connected together through a magnet yoke (19) of soft magnetic material. To achieve an especially good target utilization, the geometry and the amount of the magnetic field forming a magnetic tunnel (20) are variable relative to the magnetic field strength of another magnetic field through an electromagnetic (17), the current for the electromagnet (17) being variable in frequency, amplitude and pulse shape.