The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 28, 1989
Filed:
Apr. 16, 1986
Yung-Jui Chen, Weston, MA (US);
Boris S Elman, Brighton, MA (US);
Gary M Carter, Lexington, MA (US);
GTE Laboratories Incorporated, Waltham, MA (US);
Abstract
A method of making Y couplers and grating optical waveguides of the present invention comprises exposing the polydiacetylene to an e-beam or a similar exposing means causing a change in the index of refraction of the polydiacetylene. In the case of e-beam exposure, the optical component patent is produced by directly controlling the e-beam which does not require any physical and/or chemical preparation of the polydiacetylene. The depth of penetration of the e-beam is controlled by the scanning rate and intensity of the e-beam. The optical gratings, fabricated by e-beam exposure technique, also inherit nonlinear optical properties which can be utilized in nonlinear optical applications.