The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 28, 1989
Filed:
Dec. 16, 1986
Willem S Wijma, Drachten, NL;
U.S. Philips Corp., New York, NY (US);
Abstract
A dry-shaving apparatus comprising a housing supporting a cutter for rotation is provided in which the cutting elements of a rotatable cutter follow a constrained path defined by the shear plate and, when the elements are clear of the shear plate, follow a free path in the form of a first circular arc as part of a revolution during rotation of the cutter. The shear plate includes peripheral portions wherein the first peripheral portion is proximate to the point where the free path changes into the constrained path and the second peripheral portion is proximate to the point where the constrained path changes into the free path, the peripheral portions adjoining the housing and a central portion which in a sectional view transverse to the axis of rotation to the cutter is curved in conformity with a second circular arc which is concentric with the first circular arc and in which the centers of the two circular arcs coincide but in which the radius of the second circular arc is smaller than the radius of the first circular arc. To avoid collision, undesired vibrations and damage to parts during the change from the free path to the constrained path, the shear plate also comprises a curved transition portion adjoining the first peripheral portion and the central portion which is given a curved shape with a radius of curvature larger than the radius of curvature of the central portion.