The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 21, 1989
Filed:
May. 30, 1986
Yoshiyuki Asahara, Tokyo, JP;
Shigeaki Omi, Saitama, JP;
Hiroyuki Sakai, Tokyo, JP;
Shin Nakayama, Tokyo, JP;
Yoshitaka Yoneda, Tokyo, JP;
Hoya Corporation, Tokyo, JP;
Abstract
The present invention provides a gradient refractive index type anamorphic planar microlens which can be utilized for collimating an elliptical beam radiated from a semiconductor laser, or the like, and a method of producing such a lens. To collimate light rays, in which astigmatism exists, it is necessary to use a lens in which the respective focal distances in the directions perpendicular to an optical axis are different from each other. It includes a semiellipsoidal refractive index distribution region formed in a transparent substrate so as to have a major axis and a minor axis on a surface of the transparent substrate.