The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 14, 1989
Filed:
Apr. 23, 1987
Applicant:
Inventors:
Assignee:
High Yield Technology, Mountain View, CA (US);
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01H / ;
U.S. Cl.
CPC ...
250574 ; 356338 ; 356343 ;
Abstract
A compact particle flux monitor is formed with an enclosure through which a laser beam is directed by a lens. An aperture in the enclosure allows free particles which are to be detected to pass through a sensing area at a limiting acceptance angle thereby providing an indication of direction of particle flow. Photodiodes mounted at the sensing area detect the particles, including relatively small particles, by means of the high intensity beam portion at the region of the focal point of the light beam. The response region along the diverging beam is relatively long so that the response as a function of particle size is above background noise level.