The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 07, 1989
Filed:
Nov. 05, 1987
Applicant:
Inventor:
Kiyoshi Fujii, Tokyo, JP;
Assignee:
NEC Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G21K / ; G21K / ;
U.S. Cl.
CPC ...
378 34 ; 378 35 ; 378146 ;
Abstract
An X-ray lithography system using synchrotron radiation including X-rays is disclosed. A mirror is provided in a beam line structure between the X-ray source and the X-ray mask in the X-ray lithography apparatus. The mirror is reciprocatingly moved in the same direction as that of the X-rays from the source, or in the normal direction to that of the X-rays.