The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 07, 1989
Filed:
Apr. 16, 1987
Koike Sanso Kogyo Co., Tokyo, JP;
Abstract
The present invention relates to a plasma processing apparatus capable of obtaining a satisfactory plasma arc and a processing method used by this plasma processing apparatus. The plasma processing apparatus is constructed to vary an electric current or a voltage during start up at a fixed period for a fixed time. The plasma processing apparatus has a plasma power source capable of controlling an electric current or a voltage applied to a plasma torch, and an electrode and a nozzle are communicated by means of an electrification in the plasma torch. In a method for performing a plasma process by a plasma processing apparatus, a mixing gas has a ratio of Hydrogen to Argon in a range from 5 to 20 Vol %, and a frequency of a plasma electric current is controlled in a range from 10 to 30 KHz.