The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 07, 1989
Filed:
Dec. 23, 1987
Thomas R Tyler, Rockford, IL (US);
Sundstrand Corporation, Rockford, IL (US);
Abstract
A centrifugal pump having a self-regulating impeller discharge shutter which controls the size of flow passages from the pump impeller to the volute according to the flow demand on the pump. When the pump is operating at the design flow rate, the flow passages can be nearly fully open and, when there is a lesser demand, the area of the flow passages can be correspondingly reduced to improve stability and minimize the temperature rise within the pump. The position of the impeller discharge shutter is automatically controlled by exposure to the static pressure at the tip of the impeller and the pressure in the volute which exert oppositely-acting forces on the impeller discharge shutter.