The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 31, 1989

Filed:

Apr. 17, 1987
Applicant:
Inventor:

Johannes M Compen, Eindhoven, NL;

Assignee:

U.S. Philips Corporation, New York, NY (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J / ;
U.S. Cl.
CPC ...
313402 ; 313407 ;
Abstract

Thermal radiation reflectivity between the upright edge of the faceplate and at least the edge portion of the shadow mask is adjusted to obtain a desired temperature stabilisation level which avoids electron beam spot misalignment, such as by having selected areas of the upright edge non-aluminized while the remainder of the upright edge together with the back of the screen have a layer of aluminium thereon. The size, shape and disposition of the selected areas are chosen to obtain an optimum ratio of aluminized and non-aluminized glass surface which will provide a desired radiation coefficient. Typically at least 35% of the upright edge remains aluminized. In addition, a material having a high radiation coefficient, such as a low melting point glass with a high lead content, may be selectively applied to a peripheral portion of the shadow mask and the adjoining mounting frame.


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