The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 31, 1989
Filed:
Mar. 24, 1988
Applicant:
Inventors:
Noboru Yamamoto, Yokohama, JP;
Yasuo Matsuoka, Kawasaki, JP;
Assignee:
Kabushiki Kaisha Toshiba, Kawasaki, JP;
Primary Examiner:
Int. Cl.
CPC ...
B05C / ; B05C / ;
U.S. Cl.
CPC ...
118 52 ; 118320 ;
Abstract
A liquid state resist is dropped to form a coating on a semiconductor substrate mounted on a rotary chuck disposed in a resist coating vessel in which a sealed solvent vapor atmosphere is created. An adjusting plate is provided in the coating vessel above the rotary chuck in a stationary or movable manner to weaken or substantially reduce a swirly flow of the solvent vapor which tends to occur in the coating vessel when the chuck is rotated. Thus a substrate coated with a resist film of uniform thickness is obtained.