The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 24, 1989

Filed:

Jul. 11, 1986
Applicant:
Inventor:

Yasuo Matsuoka, Kawasaki, JP;

Assignee:

Kabushiki Kaisha Toshiba, Kawasaki, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B23K / ; B44C / ;
U.S. Cl.
CPC ...
21912143 ; 2191214 ; 156646 ; 156345 ; 430313 ; 430330 ; 2041921 ;
Abstract

A hot plate and temperature-holding plate are set in a vacuum chamber. A blank mask is taken into the vacuum chamber through an inlet port. The blank mask is placed on the hot plate. The interior pressure of vacuum chamber is reduced to a level ranging between 0.1 torr and 0.9 torr. Under this condition the blank mask is baked at a temperature of 100.degree. C..+-.5.degree. C. for 3 minutes. After the baking is brought to an end, the blank mask is carried by walking beams from the surface of the hot block to the surface of the temperature-holding plate. The blank mask is cooled to approximately room temperature on the temperature-holding plate. When the blank mask reaches the predetermined temperature level, a plasma is generated by a high frequency power source between the electrode plate, set above the blank mask and temperature-holding block, for the predetermined length of time, thereby descumming the blank mask.


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