The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 17, 1989
Filed:
Oct. 21, 1986
Applicant:
Inventor:
Jacques Schmitt, La Ville Du Bois, FR;
Assignee:
Solems, Palaiseau, FR;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B05D / ;
U.S. Cl.
CPC ...
427 38 ; 427 39 ;
Abstract
A device has a low-pressure tank placed inside an airtight chamber for plasma-depositing onto at least two substrata spaced apart in a substantial parallel relationship in the tank thin films. To effect the decomposition of the gas reagent inside the tank, at least one perforated polarized plasma generating electrode is interposed between the substrate. The airtight chamber has a pressure lower than that of the tank.