The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 10, 1989
Filed:
Nov. 03, 1983
Kathleen M Goudie, Lubbock, TX (US);
Texas Instruments Incorporated, Dallas, TX (US);
Abstract
The present invention provides an artificial pitch contour to phonological linguistic phoneme unit string data. In the event that the phonological linguistic string data includes some information on intonation contour, such as primary accent, secondary accents and rising or falling intonation mode data, this data is employed along with a determination of syllable type for each syllable to assign one of a predetermined plurality of pitch patterns to each syllable. If such intonation data is not available, as for example in a bar code or text-to-speech system, then primary and secondary accent data are generated based upon the presence or absence of strong vowels involved in word stress syllables. This invention is most useful in improving the spoken intonation contour in low data rate speech applications in which some intonation data is available.