The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 10, 1989
Filed:
Dec. 04, 1987
Andre Hecq, Nalinnes, BE;
Rene Ledroit, Les Bons Villers, BE;
Glaverbel, Brussels, BE;
Abstract
The invention relates to an article comprising a glass sheet and having an etched pattern, and to a process of manufacturing an article comprising a glass sheet and having an etched pattern. The glass sheet 11 is a chemically tempered glass sheet, and the pattern comprises one or more grooves 10 etched into the article using fluorine ions to a depth of less than 2 .mu.m. The etched grooves 10 constituting the pattern may be formed in a layer 12 of inorganic material such as SiO.sub.2. They may have a width of less than 10 .mu.m and the spacing (p) between two adjacent grooves may also be less than 10 .mu.m. The etching may be performed by applying a layer of radiation-sensitive material to at least one face of that sheet and exposing it to radiation to form a latent image of a desired groove pattern, whereafter the radiation-sensitive material is developed to form a resist and the sheet is exposed, through the resist, to the action of fluorine ions in an etching medium to etch the desired groove pattern to a depth of less than 2 .mu.m. The invention is particularly useful for forming storage discs for recording data and also for forming panels of high optical transmittance.