The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 03, 1989
Filed:
Oct. 27, 1987
Applicant:
Inventor:
Etienne L van Dorsselaer, Sintjansteen, NL;
Assignee:
OCE-Nederland B.V., Venlo, NL;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H04N / ;
U.S. Cl.
CPC ...
358283 ; 358298 ;
Abstract
The invention provides a method for reconstructing a dither matrix, used to transform a rastered gray-level image into an image of binary pixels, from the dithered image. The method includes the steps of determining the dimensions of the dither matrix from the spatial frequencies present in the dithered image and then determining the threshold values of the dither matrix from the distribution function of the pixels having a specific value.
van Dorsselaer, Etienne. (1989). Method for reconstructing a dither matrix (U.S. Patent No. 4796094). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4796094
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile