The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 03, 1989
Filed:
Mar. 07, 1988
Applicant:
Inventors:
James A Hayes, Ben Lomond, CA (US);
John T Davies, El Sobrante, CA (US);
Assignee:
Other;
Primary Examiner:
Int. Cl.
CPC ...
B23K / ;
U.S. Cl.
CPC ...
21912152 ; 21912143 ; 2191214 ; 21912136 ; 21912154 ; 31511151 ; 156345 ;
Abstract
Cleaning of low pressure chemical vapor deposition (LPCVD) furnaces is accomplished 'in-situ' at furnace operating temperatures. Radio frequency (RF) power is coupled into reactive gases, that have been metered into the evacuated furnace tube, using the furnace heating coil as the coupling element so as to create an etchant gas plasma. The gas chemistry and plasma conditions are selected to remove the LPCVD film that has accumulated on the furnace quartzware surfaces during its use in the LPCVD film deposition mode. The volatile chemical byproducts of the plasma clean reaction are removed from the furnace tube by the system's vacuum pump.