The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 27, 1988
Filed:
May. 27, 1987
Takayuki Matsukawa, Hyogo, JP;
Mitsubishi Denki Kabushiki Kaisha, Tokyo, JP;
Abstract
A substrate support structure for an ion implantation device comprises a plurality of substrate holders supporting sample substrates so that each sample substrate can be rotated around an axis perpendicular to its main surface and so that the angle of inclination of said main surface with respect to ion beams can be changed, a rotary drive for rotatively driving the sample substrates, an inclination angle adjuster for changing the angle of inclination of the sample substrate with respect to ion beams, and a rotary disk rotatably installed and supporting the plurality of substrate holders on the same circumference with the center at its rotary axis.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile