The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 20, 1988

Filed:

Oct. 02, 1987
Applicant:
Inventor:

Alfons Spies, Seebruck, DE;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01D / ;
U.S. Cl.
CPC ...
2502 / ; 2502 / ; 356374 ;
Abstract

In a photoelectric measuring device for measuring the position of two objects which can be rotated relative to each other, a grid located on a graduation support, which is connected with one of the objects, is scanned by a scanning device connected with the other object. To eliminate the eccentricity between the grid and the rotational axis of the graduation support, the light beam emitted by a light source is split in a first graduation area of the grid into two first order diffraction beams, at two diffraction angles. After two-fold deviation by two parallel mirrors, the first order diffraction beams are again joined, in a second graduation area of the grid that lies diametrically opposite the first graduation area. The first order diffraction beams join at the same diffraction angles at which they were emitted from the first graduation area of the grid. Consequently, the beams at the second graduation area are parallel to themselves as they were emitted at the first graduation area.


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