The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 13, 1988

Filed:

Jun. 18, 1987
Applicant:
Inventors:

Piet Verdiere, Kortrijk, BE;

Michel Vandeweghe, Wijtschate-Heuvelland, BE;

Assignee:

Picanol N.V., , BE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H04N / ;
U.S. Cl.
CPC ...
358101 ; 358107 ; 26 70 ; 356238 ; 356431 ; 1392 / ; 139 / ;
Abstract

A process for locating weft thread defects in woven fabrics includes using a macro (close-up) lens and video camera to produce an enlarged image of the fabric, and then observing and evaluating the weft pattern from the video generated image. Transmissive and reflecting illumination may be used on the fabric to enhance the video image. Evaluation and measurement of weft thread positions is carried out by direct visual observation or by using computerized pattern recognition systems with micro processor techniques involving digitizing the video image. A relaxation defect of weft thread is determined by measuring variation between weft thread spacing when the fabric is viewed from two different viewing angles.


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