The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 29, 1988
Filed:
Sep. 18, 1986
Frank T Smith, Pittsford, NY (US);
Eastman Kodak Company, Rochester, NY (US);
Abstract
A process of preparing a laterally confined positive index waveguide is disclosed in which a monocrystalline substrate comprised of a III-V compound is provided having adjacent one major surface monocrystalline gallium aluminum arsenide having a resistivity greater than 10.sup.5 ohm-cm. A protective layer is provided on the substrate, and a channel is opened in the substrate to expose an unprotected portion of the substrate. A waveguide region is formed by selectively depositing epitaxially on only the unprotected portion of the substrate at least one III-V compound of a higher refractive index than the substrate monocrystalline gallium aluminum arsenide. Epitaxial deposition is terminated when the waveguide region forms with the one major surface an overall planar surface, and at least on layer bridging the substrate and the waveguide region is deposited on the planar surface.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile