The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 29, 1988
Filed:
Mar. 21, 1986
Robert A Long, Towanda, PA (US);
Harrison Shallenberger, Towanda, PA (US);
Dale E Wittmer, Carbondale, IL (US);
GTE Products Corporation, Stamford, CT (US);
Abstract
A method is disclosed for producing silicon nitride wherein the crystal morphology is controlled. The method involves heating a mixture consisting essentially of a chlorosilane and ammonia at a sufficient temperature for a sufficient time to produce a nitogen containing silane as an intermediate. The bulk density of the intermediate is controlled to less than about 0.1 g/cc to result in the silicon nitride having a crystal morphology which is essentially all fibrous, or the bulk density can be controlled to greater than about 0.3 g/cc to result in the silicon nitride having a crystal morphology which is essentially all equiaxial, or the bulk density can be controlled to between about 0.1 g/cc and about 0.3 g/cc to result in the silicon nitride having a crystal morphology which is a mixture of fibrous and equiaxial. The intermediate is then heated at a sufficient temperature for a sufficient time in a non-oxidizing atmosphere to produce the controlled crystal morphology silicon nitride.