The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 15, 1988
Filed:
Nov. 12, 1986
Eiji Kanada, Nagaokakyo, JP;
Yasuo Tsubai, Nagaokakyo, JP;
Akira Tanaka, Nagaokakyo, JP;
Toshiro Kondo, Nagaokakyo, JP;
Yoshikazu Takaya, Nagaokakyo, JP;
Masahiko Saikawa, Nagaokakyo, JP;
Hiroshi Nishinoiri, Nagaokakyo, JP;
Mitsubishi Paper Mills, Ltd., Tokyo, JP;
Abstract
Lithographic printing plates which have such a high sensitivity as permitting use of semiconductor laser beam of low output, a high resolving power and a high printing endurance and are free from occurrence of scumming are made by a method which comprises imagewise exposing a light sensitive material which comprises a support and at least a silver halide emulsion layer and a surface physical development nuclei layer provided on the support, said emulsion layer comprising silver halide grains which contain at least silver bromide and containing at least one sensitizing dye having a maximum spectral sensitivity in the region of longer than 700 .mu.m and then developing the exposed light sensitive material with a silver complex diffusion transfer developer containing at least a thiocyanate. Further improvement can be obtained by providing an antihalation means to keep the reflectance of a light of longer than 700 .mu.m at 13-40%.