The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 08, 1988
Filed:
Jan. 08, 1986
Gregory A Roche, Santa Clara, CA (US);
Other;
Abstract
An apparatus wherein a beam of substantially coherent light passes through a window in a chamber and then through the chamber in a direction substantially parallel, and contiguous, to substrates in the chamber. The beam ionizes gases in a mixture in the chamber. The ionized gases combine to form a substance which becomes deposited on the substrate(s) as a layer or which etches a previously deposited layer on the substrate. As the beam moves through the chamber, it loses energy. Various individual, or combinations of, compensations for this loss of energy may include the following: (1) the substrate(s) may be tilted slightly to decrease the distance between the beam and the substrate(s) as the beam moves through the chamber; (2) the beam may be tapered in a direction along the substrate(s); (3) the rate and direction of the flow of a mixture of ionizable gases through the chamber may be adjusted; (4) the rate and direction of flow of a gas for neutralizing the ionization of the gases may be adjusted; (5) the rate of flow of the ionizable gases may be individually adjusted for each substrate; (6) the rate and direction of flow of the neutralizing gas may be individually adjusted for each substrate; and (7) the beam may be regulated by splitting it between two compartments of the chamber.