The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 01, 1988
Filed:
Aug. 20, 1986
Applicant:
Inventor:
Derek Aitken, South Holmwood, GB;
Assignee:
Applied Materials, Inc., Santa Clara, CA (US);
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J / ; H01J / ;
U.S. Cl.
CPC ...
328233 ; 3133601 ; 2504 / ; 2504293 ;
Abstract
A system for post analysis acceleration of an ion beam to a selected energy without beam blow-up. A group of electrodes extablish a non-linear voltage gradient along the beam axis for accelerating and then decelerating the beam to the selected energy level with focusing.
Aitken, Derek. (1988). Systems and methds for ion beam acceleration (U.S. Patent No. 4782304). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4782304
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile