The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 25, 1988
Filed:
Jan. 30, 1987
Nippon Kogaku K.K., Tokyo, JP;
Abstract
A projection exposure apparatus includes illuminating means for applying energy rays to a mask having a predetermined pattern formed thereon, a projection optical system for forming the image of the pattern in a predetermined projected state on a responsive substrate, adjusting means for correcting the fluctuation of the projected state of the image caused by the passage of the energy rays, exposure control means for controlling the energy rays so that the pojected image of the pattern by the projection optical system is transferred onto the responsive substrate under a predetermined exposure condition, means for making information regarding the reflectivity of the responsive substrate, and main control means for controlling the adjusting means on the basis of the predetermined exposure condition of the exposure control means and the information regarding the reflectivity.