The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 18, 1988

Filed:

Oct. 17, 1986
Applicant:
Inventors:

Zbigniew Drozdowicz, Stony Brook, NY (US);

Harvey Stone, Flushing, NY (US);

John Vogler, Smithtown, NY (US);

Assignee:

Quantronix Corporation, Smithtown, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05D / ; B32B / ; B23K / ;
U.S. Cl.
CPC ...
427 531 ; 2191216 ; 21912185 ; 21912176 ; 21912183 ; 427140 ; 427142 ; 430-5 ; 430945 ;
Abstract

A method and device are provided to accomplish laser driven pyrolytic, photolytic and photoactivativation process requiring controlled atmosphere without the use of gas tight cells. A method and device are provided to correct clear faults on a photo-lithographic mask by metallic deposition on the mask at standard temperature and pressure. The deposition is formed by the pyrolytic decomposition of an organometallic gas mixture which may include chromium and molybdenum hexacarbonyls, and a buffer gas. The decomposition is done utilizing a laser beam. The device may be incorporated into a system which has other members used to correct opaque faults in the same mask.


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