The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 18, 1988
Filed:
Aug. 13, 1984
Applicant:
Inventor:
Shih-Chia Chang, Troy, MI (US);
Assignee:
General Motors Corporation, Detroit, MI (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B44C / ; C03C / ; C03C / ; C23F / ;
U.S. Cl.
CPC ...
156643 ; 156646 ; 156655 ; 1566591 ; 156667 ; 20419235 ; 252 791 ;
Abstract
High resolution patterns can be etched in tin oxide films in one step using reactive ion etching when the reactant gas consists substantially of nitrogen and/or argon and from small but effective amounts of hydrogen up to about 10 percent by volume hydrogen.
Quick Actions:
Chang, Shih-Chia. (1988). Reactive ion etching of tin oxide films using neutral reactant gas (U.S. Patent No. 4778562). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4778562
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile