The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 18, 1988
Filed:
Nov. 24, 1987
Richard T Martin, Santa Barbara, CA (US);
Applied Magnetics Corporation, Goleta, CA (US);
Abstract
Apparatus for indexing and accurately registering a selected stabilized mask of a plurality of stabilized masks between a substrate and a source during vacuum deposition wherein the apparatus has a mask supporting frame including a mechanism for supporting at least two stabilized masks each having openings which define a pattern and wherein the at least two stabilized masks are supported in a planar spaced relationship relative to each other and have a preselected spacing between the centers thereof, guide and support rollers operatively coupled to the mask supporting frame for supporting the mask supporting frame for lateral movement along a predetermined path between a first position and a second position wherein the first position indexes one of said two of the stabilized masks between a substrate and a source at a working station and the other of the two stabilized masks at a different location along the predetermined path and wherein the second position indexes the other of the two stabilized masks at the same working station and the one of the two stabilized masks at another different location along the predetermined path, a drive member operatively coupled to the mask supporting frame for moving the same in a linear direction along the predetermined path between the first position and the second position to index a selected stabilized mask of the two stabilized masks to a working station and a gantry assembly for supporting a substrate in a predetermined relationship to the source and having reference registration members for positioning and accurately registering the substrate relative to prealigned registration members located on the selected stabilized mask indexed to the working station is shown.