The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 11, 1988

Filed:

Dec. 12, 1986
Applicant:
Inventor:

Vasanth R Kamath, E. Amherst, NY (US);

Assignee:

Pennwalt Corporation, Philadelphia, PA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C08F / ; C08F / ; C08F / ;
U.S. Cl.
CPC ...
526 86 ; 526 78 ; 526 79 ; 526208 ; 526209 ; 526210 ; 526212 ; 526213 ; 526227 ; 526228 ; 526230 ; 5262305 ; 526231 ; 526232 ; 5262323 ; 5262325 ; 52631842 ; 526320 ;
Abstract

A process is provided for the free radical polymerization of monomers derived from substituted or unsubstituted acrylic acid/methacrylic acid and esters thereof for the production of a polymer having a narrow molecular weight distribution and an average molecular weight of less than 4000. These polymers are produced by the solution polymerizing of said monomers wherein 20-40% by weight of the monomer composition is hydroxyalkyl acrylate or methacrylate in the presence of a solvent system suitable for high solids coating applications and in the presence of an initiating amount of a tertiary alkyl hydroperoxide and/or its derivatives having at least 5 carbons wherein the initiator and monomers, alone or in combination, are added continuously at a programmed rate wherein the rate of addition corresponds approximately to the rate of decomposition of said monomer and initiator. These polymers are used for high solids coating applications.


Find Patent Forward Citations

Loading…