The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 11, 1988
Filed:
Oct. 21, 1986
Applicant:
Inventors:
Nobuhiko Kawatsuki, Kurashiki, JP;
Masao Uetsuki, Kurashiki, JP;
Assignee:
Kuraray Co., Ltd., , JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03C / ; G03C / ;
U.S. Cl.
CPC ...
430290 ; 430325 ; 430330 ; 430285 ; 430287 ;
Abstract
A method for manufacturing a combination pattern-refraction modification type phase grating comprises the steps of (1) forming a thin film of composition which includes a photosensitive acrylic acid or methacrylic acid group polymer including double bonds between carbons and at least one of compounds selected from aromatic aldehyde and aromatic ketone which have a substituent or a no-substituent (2) irradiating the thin film in a regularly arranged pattern with ultraviolet rays and (3) removing the non-reacted compound.