The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 11, 1988
Filed:
Nov. 21, 1986
Applicant:
Inventor:
Albert Feuerstein, Neuberg, DE;
Assignee:
Leybold-Heraeus GmbH, Cologne, DE;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C / ;
U.S. Cl.
CPC ...
427 42 ; 427 38 ; 20419231 ;
Abstract
A method and apparatus are disclosed for the reactive vapor deposition of metal compounds onto a substrate. At least one metal is evaporated from an elongated evaporation crucible in an atmosphere consisting of a reaction gas at a pressure of no more than 10.sup.-1 mbar. The metal is evaporated by means of an electron beam having an acceleration voltage of at least 20 kv. The invention solves the problem of providing stable an repeatable operating conditions, even with an evaporation crucible of considerable length.