The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 11, 1988

Filed:

Nov. 12, 1987
Applicant:
Inventors:

Lawrence W Dougherty, Sleepy Hollow, IL (US);

James R Fendley, Arlington Heights, IL (US);

James L Kraner, Barrington, IL (US);

Assignee:

Zenith Electronics Corporation, Glenview, IL (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J / ; H01J / ;
U.S. Cl.
CPC ...
445 45 ; 29423 ; 29464 ; 430 23 ; 445 30 ; 445 52 ;
Abstract

A proceses is disclosed for use in the manufacture of a color cathode ray tube having a rectangular flat faceplate. The process comprises positioning the faceplate in a predetermined x-y plane by referencing faceplate a-b-c reference areas on two adjacent edges or sides of the faceplate with complementary a-b-c reference points on a faceplate locating fixture; the fixture also has three spaced six-point precision indexing means. With the faceplate a-b-c reference areas and the faceplate locating fixture a-b-c points mutually referenced, six-point precision indexing means are attached to the faceplate in registation with the precision indexing means on the faceplate locating fixture. Using the precision indexing means attached to the faceplate, a shadow mask is registered with the faceplate through the use of complementary precision indexing means to provide a faceplate-shadow mask assembly in mutual precise registry. Using the registered faceplate-shadow mask assembly, a pattern of phosphors is photodeposited on the faceplate by photoexposure means. The registry of the pattern of phosphors and the shadow mask is accomplished according to the invention with a precision made possible by the use of the six-point precision indexing means, and the location of the patterns on the faceplate is made possible by the use of the a-b-c referencing of the faceplate and the faceplate locating fixture.


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