The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 11, 1988

Filed:

Sep. 29, 1983
Applicant:
Inventors:

Yong K Park, Vadnais Heights, MN (US);

Anil K Jain, New Brighton, MN (US);

Assignee:

Honeywell Inc., Minneapolis, MN (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G02F / ;
U.S. Cl.
CPC ...
350354 ;
Abstract

A nonlinear optical medium wherein the optical index of refraction is a function of the intensity of light irradiating the medium, is employed in various devices to affect at least a portion of an incoming light beam by refracting or reflecting that portion of the light and thereby reduce the amount of light falling on an object. The nonlinear optical medium is employed in a resonator optical bistable device, in a self-bending approach and in a self-defocusing approach to provide the protective function. The spatial profile of light intensity of the incoming light can be shaped prior to the incoming light irradiating the nonlinear medium or the nonlinear medium itself can be shaped to provide the path altering function. A laser hardened device with ultra fast switching time, a large dynamic range and passive operation is a preferred application of the present invention.


Find Patent Forward Citations

Loading…