The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 11, 1988

Filed:

Apr. 27, 1987
Applicant:
Inventor:

Herman F Nied, Clifton Park, NY (US);

Assignee:

General Electric Company, Schenectady, NY (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C23C / ;
U.S. Cl.
CPC ...
118720 ; 118723 ;
Abstract

Apparatus for performing a plasma enhanced chemical vapor deposition on an edge of a polycarbonate sheet includes a conduit having an axially disposed slit therethrough for engaging the sheet so as to position the edge in the conduit. Axially disposed electrodes are attached to the conduit and positioned to be on generally opposite sides of the edge. Means are provided for applying a separate electrical potential to each of the electrodes, and at least one aperture is provided in the conduit for introducing and removing a gas therefrom.


Find Patent Forward Citations

Nied, Herman. (1988). Apparatus for performing a plasma enhanced chemical vapor deposition on (U.S. Patent No. 4776298). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4776298

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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