The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 04, 1988
Filed:
Oct. 28, 1986
Masao Kosugi, Yokohama, JP;
Yukio Tokuda, Kawasaki, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
A step-and-repeat type exposure apparatus includes an X-Y stage for moving stepwise a workpiece such as a wafer relative to a projection lens system so that images of a pattern of an original such as a reticle are transferred onto different areas on the wafer in sequence. After exposures of such areas of the wafer that are included in one of plural regions of the wafer, the position of the wafer relative to the X-Y stage is shifted. Then, exposures of the areas included in another region of the wafer are effected. In another aspect, the step-and-repeat exposures of the wafer are effected along a direction inclined to the moving directions of the X-Y stage.