The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 04, 1988
Filed:
Jun. 09, 1987
Karl A Schulke, Neuberg, DE;
Christopher J Bayne, Lightwater, GB;
Geoffrey Hayward, North Camberley, GB;
Heraeus Quarzschmelze GmbH, Hanau, DE;
Abstract
An oven for the heat treatment of semiconductor substrates, especially a diffusion oven, having an upright, heatable quartz tube and a support system made of up rods or tubes into which one or more diffusion racks can be inserted which accommodate the wafer-like substrates separated from one another and substantially parallel to one another. To create a vertically operated oven having a rheologically efficient construction in which the support system for holding the diffusion racks will be highly variable, the support system has at least two vertical supports arranged parallel to one another, on which at least one rack rest 9 is disposed, on which rack rest the diffusion rack is placed such that the substrate wafers 8 stand substantially on edge during the treatment.