System for inspecting exposure pattern data of semiconductor integrated

Abstract

A system for inspecting exposure pattern data in the form of coordinate data for forming a reticle of a semiconductor integrated circuit device, on the basis of video signals. The inspection system includes a unit for inputting exposure pattern data in the form of coordinate data form in response to a request for a test region, converting the input exposure pattern data to data corresponding to an actual pattern in a two-dimensional form, storing the converted data, and outputting the stored data in the form of video signals; a unit for testing the exposure pattern data from the inputting and converting unit on the basis of the video signals under a predetermined pattern rule; and a unit for outputting data tested at the pattern testing unit. The pattern test unit includes a variety of test circuits, such as a slit test circuit, a comparator, a combination circuit, etc., used for a pattern test.