The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 27, 1988

Filed:

Jan. 26, 1988
Applicant:
Inventors:

Takeshi Imai, Chiba, JP;

Masahiko Suzuki, Chiba, JP;

Ikuzo Takahashi, Chiba, JP;

Shuzo Toida, Chiba, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C07F / ;
U.S. Cl.
CPC ...
556456 ;
Abstract

A method for purifying impure hexamethyldisiloxane comprising as a major portion hexamethyldisiloxane and as a minor portion a mixture of low-boiling organic solvents, other organosilicon compounds, and odor-producing materials is described. The method comprises (A) first, treating the impure hexamethyldisiloxane with a condensation catalyst to convert the organosilicon compounds to additional hexamethyldisiloxane; (B) second, washing the treated impure hexamethyldisiloxane with water; (C) third, separating a water phase from the washed impure hexamethyldisiloxane; (D) fourth, distilling the washed impure hexamethyldisiloxane to yield hexamethyldisiloxane of enhanced purity; (E) fifth, contacting the hexamethyldisiloxane of enhanced purity with acid clay at a temperature of greater than about 50.degree. C.; and (F) finally, contacting the acid clay treated hexamethyldisiloxane of enhanced purity treated in (E) with activated carbon to yield hexamethyldisiloxane with enhanced purity and minimal unpleasant odor.


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