The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 27, 1988

Filed:

Dec. 22, 1986
Applicant:
Inventors:

Toshiya Mizuno, All of Iwaki, JP;

Takao Ichii, All of Iwaki, JP;

Hideyuki Yasumi, All of Iwaki, JP;

Yo Iizuka, All of Iwaki, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B29C / ; B29C / ; B29C / ; C08G / ;
U.S. Cl.
CPC ...
525535 ; 2642102 ; 2642893 ; 2642902 ; 26433111 ; 428419 ; 428704 ; 525537 ; 528388 ;
Abstract

Disclosed herein is a process for producing a biaxially oriented paraphenylene sulfide block copolymer film, comprising melt extruding and molding a paraphenylene sulfide block copolymer essentially composed of recurring units (A): ##STR1## and recurring units (B): ##STR2## the molar fraction of recurring units (A) being 0.50-0.98, and having a melt viscosity (.eta.*) of 1,000-50,000 poises as measured at 310.degree. C. and shear rate of 200 sec.sup.-1, into a film, and after cooling, biaxially stretching the thus molded film at a stretching temperature (T) defined by the following formula:


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