The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 20, 1988
Filed:
Jul. 06, 1987
Rolf Mulhaupt, Marly, CH;
Hubert Simon, Mulhouse, FR;
Ciba-Geigy Corporation, Ardsley, NY (US);
Abstract
Compounds of the general formula I ##STR1## in which R.sup.1 is hydrogen, C.sub.1 -C.sub.12 -alkyl, C.sub.5 -C.sub.7 -cycloalkyl, phenyl or benzyl and R.sup.2 is hydrogen or C.sub.1 -C.sub.4 -alkyl, or R.sup.1 and R.sup.2, together with the C atom to which they are attached, form a 5-membered or 6-membered ring, and R.sup.3, R.sup.4, R.sup.5 and R.sup.6 are identical or different and are hydrogen, C.sub.1 -C.sub.12 -alkyl, phenyl which is unsubstituted or monosubstituted to trisubstituted by C.sub.1 -C.sub.4 -alkyl, halogen or C.sub.1 -C.sub.4 -alkoxy, or is a group of the formula --CH.sub.2 OR.sup.7 (II) in which R.sup.7 is C.sub.1 -C.sub.12 -alkyl, phenyl which is unsubstituted or monosubstituted to trisubstituted by C.sub.1 -C.sub.4 -alkyl, halogen or C.sub.1 -C.sub.4 -alkoxy, or is --C(O)--R.sup.8, and R.sup.8 is C.sub.1 -C.sub.12 -alkyl, and also not more than two of the radicals R.sup.3, R.sup.4, R.sup.5 and R.sup.6 are one or two groups of the formula --CH.sub.2 CH.sub.2 Si(OR.sup.9).sub.3 (III), --CH.sub.2 OC(O)CH.sub.2 CH.sub.2 Si(OR.sup.9).sub.3 (IV), --CH.sub.2 O(C.sub.m H.sub.2m)Si(OR.sup.9).sub.3 (V) or ##STR2## in which R.sup.9 is C.sub.1 -C.sub.4 -alkyl or phenyl and m is a number from 1 to 8 and r is a number 1 or 2 and t is 0, 1 or 2 and R.sup.1 is as defined above, and, in addition, compounds of the formula I in which R.sup.4 and R.sup.5 together form a group of the formula ##STR3## in which R.sup.9 is as defined above and R.sup.3 and R.sup.6 in this case are hydrogen and n is 1 or 2 and, if n is 1, Z is an organic radical which is derived from a primary amine ZnH.sub.2 and can contain one or two --Si(OR.sup.9).sub.3 groups and, if n is 2, Z is a divalent organic radical derived from a diprimary diamine H.sub.2 NZNH.sub.2 ; subject to the proviso that the compounds of the formula I contain one to three --Si(OR.sup.9).sub.3 groups, are suitable for use as adhesion promoters, particularly for moisture-curing epoxide and polyurethane resins.