The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 13, 1988
Filed:
May. 19, 1987
Erik K Nelson, Centerville, OH (US);
Michael E Demarchi, Centerville, OH (US);
David A Boyer, Miamisburg, OH (US);
The Mead Corporation, Dayton, OH (US);
Abstract
The present invention provides an imaging process wherein the pressure application developer means is not contaminated during pressure development. The process involves an imaging web including a support having a layer on the surface thereof of photosensitive microcapsules including an internal phase of a photohardenable photosensitive composition and a color former. The imaging web is image-wise exposed to a first source of actinic radiation to form an image area; this exposure defines a border area in the web comprising the areas of the imaging web surrounding the image area. The image area of the imaging web is contacted with an opaque receiver sheet. The border area is then uniformly exposed to a second source of actinic radiation to harden the microcapsules in the border area. The entire surface of the imaging sheet is then subjected to a uniform rupturing force such that the microcapsules rupture and release the internal phase in accordance with the image-wise exposure to react with the developer material associated with the imaging sheet or the receiver sheet to produce an image.